Accelerators are playing an increasingly important role in the science and technology of materials. Applications of particle accelerators in preparation and diagnostics of high tech materials especially semiconductors has seen continuous growth in the last three decades. Since accelerators can produce beams of practically any element, these are being used as sources as well as tools which deliver ion beams with well defined mass, charge and energy. Such an accelerator has recently been designed and locally fabricated at PINSTECH which has the following characteristics:
It is a 250 keV ion accelerator which can deliver all gaseous ions like H+, N+, O+, He+, Ne+, Ar+, Kr+, Xe+ or molecular ions.
The energy range is flexible and ions between 50 to 250 keV can be delivered to a target of dimensions ranging from few mm to many cms.
Ion implantation of suitable ions into metals and alloys can improve surface properties resulting in enhancement of surface hardening, corrosion resistance and other mechanical and Chemical properties. For example by implantation of Mo, Sn and Pb ions into steel, friction can be reduced by upto 50%. Oxidation is also inhibited by implantation of suitable ions like B+, Ca+ into metals. PINSTECH accelerator can be used by mutual arrangement between PINSTECH and industry or any other organizations.
Charged Particle Accelerator
for Ion Implantation
Sample Requirement
Maximum size of the sample is one inch square.
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